Synthesis and tribological characteristics of nanocrystalline diamond film using CH4/H2 microwave plasmas

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 877-881

  Hong, Sung Pill ^a   Yoshikawa, Hiromichi ^a   Wazumi, Koichiro ^a   Koga, Yoshinori ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Microwave plasma chemical vapor deposition; Nanocrystalline diamond; Transmission electron microscopy; UV raman spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROWAVES; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

MICROWAVE PLASMAS;

DIAMONDS;

DIAMOND; FILM; FRICTION; PLASMA TREATMENT; TRIBOLOGY; VAPOR DEPOSITION; WEAR RESISTANCE;

EID: 0036508325     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00634-3     Document Type: Article

References (13)