Negative differential resistance of oligo(phenylene ethynylene) self-assembled monolayer systems: The electric-field-induced conformational change mechanism

Journal of Physical Chemistry C

Volumn 115, Issue 9, 2011, Pages 3722-3730

  Kim, Hyungjun ^a,b   Jang, Seung Soon ^c   Kiehl, Richard A ^d   Goddard, William A ^a,b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^c Georgia Institute of Technology   (United States)

^d University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMATIONAL CHANGE; EXPERIMENTAL OBSERVATION; FIRST-PRINCIPLES; I - V CURVE; LATTICE MONTE CARLO; MESOSCALE; MICROSCOPIC LEVELS; MICROSCOPIC MODELS; MOLECULAR BASIS; MOLECULAR SYSTEMS; NEGATIVE DIFFERENTIAL RESISTANCES; QUANTUM MECHANICS; ROOM TEMPERATURE; STRUCTURAL CHANGE; THIOLATES;

AROMATIC COMPOUNDS; COMPUTER SIMULATION; NEGATIVE RESISTANCE; ORGANIC POLYMERS; POLYETHYLENES; QUANTUM THEORY; SELF ASSEMBLED MONOLAYERS;

MONTE CARLO METHODS;

EID: 79952285450     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1114916     Document Type: Article

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