Fabrication and characterization of Ag intermediate transparent and conducting TiON/Ag/TiON multilayer films

Optics Communications

Volumn 284, Issue 9, 2011, Pages 2303-2306

  Kim, Y S ^a,b   Lee, Y J ^a   Heo, S B ^a   Lee, H M ^a   Kim, J H ^a   Kim, S K ^a   Chae, J H ^b   Choi, J I ^c   Kim, Daeil ^a  

^a University of Ulsan   (South Korea)

^b New Optics   (South Korea)

^c KTR Metallic Assessment Team   (South Korea)

Author keywords

Ag; Optical transmittance; Sheet resistance; TiON; Work function

Indexed keywords

AG; AG FILMS; AG THICKNESS; CRYSTALLINE STRUCTURE; DC MAGNETRON SPUTTERING; DIFFRACTION PEAKS; ELECTRICAL RESISTIVITY; FIGURE OF MERIT; GLASS SUBSTRATES; OPTICAL TRANSMITTANCE; OPTOELECTRICAL PROPERTIES; TION; TRANSPARENT ELECTRODE; XRD PATTERNS;

CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; FLAT PANEL DISPLAYS; MULTILAYER FILMS; OPACITY; SHEET RESISTANCE; SUBSTRATES; WORK FUNCTION;

SILVER;

EID: 79951943798     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2010.12.066     Document Type: Article

References (15)

1. J.H. Park, J.H. Chae, and D. Kim J. Alloy. Comp. 478 2009 330
2. J. Ting, and B.S. Tsai Mater. Chem. Phys. 72 2001 273
3. S. Flickyngerova, M. Netrvalova, L. Prusakova, I. Novotny, P. Sutta, and V. Tvarozek Vacuum 84 2009 215
4. C. Guillén, and J. Herrero Sol. Energy Mater. Sol. Cells 92 2008 938
5. Y.S. Kim, J.H. Park, and Daeil Kim Vacuum 82 2008 574
6. F. Fabreguette Surf. Coat.Technol 125 2000 396
7. S.H. Mohamed Phys. Stat. Sol. 201 2004 90
8. A. Bitter J. Vac. Sci. Technol. A 15 1997 223
9. G. Haacke J. Appl. Phys. 47 1976 4086
10. J.Y. Lee, J.W. Yang, J.H. Chae, J.H. Park, J.I. Choi, H.J. Park, and D. Kim Optic. Comm. 282 2009 2362
11. D. Kim J. Alloys Comp. 493 2010 208
12. D. Kim Vacuum 83 2008 448
13. D. Kim Display 31 2010 155
14. E. Elangovan, G. Gonçalves, R. Martins, and E. Fortunato Sol. Energy 83 2009 726
15. V. Papaefthimiou, and S. Kennou Surf. Sci. 566 2004 497