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Volumn 32, Issue 3, 2011, Pages 453-463
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Electroplating of copper in the presence of 5,6-dihydropyrimidine-2-(1h)-thione, 2-methylthiopyrimidine-4-(1h)-one, 2-thiopyrimidine-4-(1h)-ones, and 2,4-pyrimidine(1h,3h)-dione derivatives as organic additives
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Author keywords
Corrosion inhibition; Electrodeposition; Limiting current; Mass transfer; Thiopyrimidines
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Indexed keywords
COPPER CATHODES;
CORROSION INHIBITION;
DIFFUSION CONTROLLED;
ELECTRODE PROCESS;
ELECTROPLATING REACTIONS;
INHIBITION EFFICIENCY;
LIMITING CURRENT;
MASS TRANSFER CORRELATION;
ORGANIC ADDITIVES;
THIOPYRIMIDINE;
THIOPYRIMIDINES;
ACTIVATION ENERGY;
COPPER;
CORROSION PREVENTION;
ELECTRODEPOSITION;
MASS TRANSFER;
ADDITIVES;
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EID: 79951873243
PISSN: 01932691
EISSN: 15322351
Source Type: Journal
DOI: 10.1080/01932690903232279 Document Type: Article |
Times cited : (6)
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References (38)
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