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Volumn 32, Issue 3, 2011, Pages 453-463

Electroplating of copper in the presence of 5,6-dihydropyrimidine-2-(1h)-thione, 2-methylthiopyrimidine-4-(1h)-one, 2-thiopyrimidine-4-(1h)-ones, and 2,4-pyrimidine(1h,3h)-dione derivatives as organic additives

Author keywords

Corrosion inhibition; Electrodeposition; Limiting current; Mass transfer; Thiopyrimidines

Indexed keywords

COPPER CATHODES; CORROSION INHIBITION; DIFFUSION CONTROLLED; ELECTRODE PROCESS; ELECTROPLATING REACTIONS; INHIBITION EFFICIENCY; LIMITING CURRENT; MASS TRANSFER CORRELATION; ORGANIC ADDITIVES; THIOPYRIMIDINE; THIOPYRIMIDINES;

EID: 79951873243     PISSN: 01932691     EISSN: 15322351     Source Type: Journal    
DOI: 10.1080/01932690903232279     Document Type: Article
Times cited : (6)

References (38)
  • 18
    • 0004234072 scopus 로고    scopus 로고
    • Schlesinger, M. and Paunovic, M. (Eds.), New York: John Wiley
    • Schlesinger, M. and Paunovic, M. (Eds.) (2000) Modern Electroplating; New York: John Wiley.
    • (2000) Modern Electroplating


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.