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Volumn 109, Issue 3, 2011, Pages

TiO2-based metal-insulator-metal selection device for bipolar resistive random access memory cross-point application

Author keywords

[No Author keywords available]

Indexed keywords

CROSS-POINT ARRAY; CURRENT PATHS; MEMORY CELL; METAL INSULATOR METALS; NANO-METER-SCALE; RESISTIVE RANDOM ACCESS MEMORY; SIMPLE METALS; TIO; TYPE SELECTION;

EID: 79951825640     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3544205     Document Type: Article
Times cited : (152)

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    • 0556-2805, 10.1103/PhysRevB.68.035416
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    • Wang, W.1    Lee, T.2    Reed, M.A.3
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    • International Semiconductor Device Research Symposium (ISDRS), College Park, MD, December 9-11, 2009.
    • J. J. Huang, G. L. Lin, C. W. Kuo, W. C. Chang, and T. H. Hou, International Semiconductor Device Research Symposium (ISDRS), 2009, College Park, MD, December 9-11, 2009.
    • (2009)
    • Huang, J.J.1    Lin, G.L.2    Kuo, C.W.3    Chang, W.C.4    Hou, T.H.5
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    • Kumar, M.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.