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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1620-1624

Structural anisotropy in a-Mgx Zn1-xO (0≤x≤0.33) films on r-sapphire

(3) Saraf, Gaurav a,d Siegrist, Theo b,c,e Lu, Yicheng a

a RUTGERS UNIVERSITY (United States)

b LUCENT TECHNOLOGIES (United States)

c Department of Chemistry ^* (United States)

d EPV Solar Inc (United States)

e FAMU FSU COLLEGE OF ENGINEERING (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; ORGANIC CHEMICALS; SAPPHIRE; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

A-PLANE; DEPOSITION TIME; IN-PLANE STRAINS; METAL-ORGANIC; METALORGANIC CHEMICAL VAPOR DEPOSITION; R-SAPPHIRE; SAPPHIRE SUBSTRATES; STRAIN ANISOTROPIES; STRUCTURAL ANISOTROPY; SYNCHROTRON X RAY DIFFRACTION;

FILM THICKNESS;

EID: 79951618900 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3137013 Document Type: Conference Paper

Times cited : (8)

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