Transient phenomena in the dielectric breakdown of HfO2 optical films probed by ultrafast laser pulse pairs

Applied Physics Letters

Volumn 97, Issue 19, 2010, Pages

  Nguyen, Duy N ^a   Emmert, Luke A ^a   Patel, Dinesh ^b   Menoni, Carmen S ^b   Rudolph, Wolfgang ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b Department of Mechanical Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC BREAKDOWNS; ELECTRON DENSITIES; GAP STATE; INTERMEDIATE STATE; LASER INDUCED BREAKDOWN; PICOSECONDS; PULSE DURATIONS; THEORETICAL MODELS; TIME-SCALES; TRANSIENT PHENOMENON; TRANSIENT REGIME; ULTRAFAST LASER PULSE; VARIABLE DELAYS;

ELECTRON MOBILITY; HAFNIUM COMPOUNDS; LASER PULSES; ULTRAFAST PHENOMENA;

ULTRAFAST LASERS;

EID: 78249255527     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3511286     Document Type: Article

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