In-situ monitoring of the growth of nanostructured aluminum thin film

Journal of Nanophotonics

Volumn 5, Issue 1, 2011, Pages

  Novotny, Michal ^a   Bulir, Jiri ^a   Lancok, Jan ^a   Pokorny, Petr ^a   Bodnar, Michal ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

aluminum ultrathin film; electrical conductivity; in situ monitoring; magnetron sputtering; mass spectroscopy; optical emission spectroscopy; spectral ellipsometry

Indexed keywords

ALUMINUM; ELECTRIC CONDUCTIVITY; ELLIPSOMETRY; FILM GROWTH; INTERPOLATION; LIGHT EMISSION; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MONITORING; NANOSTRUCTURES; OPTICAL EMISSION SPECTROSCOPY; OPTICAL FILMS; OPTICAL PROPERTIES; PLASMONICS; SCANNING ELECTRON MICROSCOPY; SOLVENTS; ULTRATHIN FILMS; EMISSION SPECTROSCOPY; MASS SPECTROMETERS; OPTICAL CONSTANTS; SPLINES;

ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIVITY; IN- SITU MONITORING; MASS SPECTROSCOPY; PERCOLATION THRESHOLDS; PLASMA CHARACTERIZATION; RF-MAGNETRON SPUTTERING; SPECTRAL ELLIPSOMETRY; IN-SITU MONITORING; OPTICAL EMISSIONS;

GROWTH RATE; OPTICAL EMISSION SPECTROSCOPY;

EID: 79551710920     PISSN: None     EISSN: 19342608     Source Type: Journal    
DOI: 10.1117/1.3543816     Document Type: Article

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