Model of an inductively coupled negative ion source: I. General model description

Plasma Sources Science and Technology

Volumn 20, Issue 1, 2011, Pages

  Hagelaar, G J M ^a,b   Fubiani, G ^a,b   Boeuf, J P ^a,b  

^a d'Hydraulique et des Telecommunications   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATIC COUPLING; ENERGY EQUATION; EXPANSION CHAMBER; FLUID MODELS; GENERAL MODEL; INDUCTIVELY-COUPLED; NEUTRAL BEAMS; NEUTRAL GAS; NEUTRAL GAS FLOW; PAPER DOCUMENTS; PLASMA CHEMISTRIES; PLASMA ELECTRONS; PLASMA PROPERTIES; PLASMA TRANSPORT; RADIO FREQUENCY POWER; REALISTIC CONDITIONS; SEMI-IMPLICIT; SHEATH THICKNESS; SHEATH VOLTAGE; SOURCE DRIVER; SURFACE PROCESS;

ELECTROMAGNETIC INDUCTION; FUSION REACTORS; ION SOURCES; MAGNETIC FIELDS; MAGNETIC FILTERS; MAGNETIC SEPARATORS; NEGATIVE IONS; NUMERICAL METHODS; POISSON EQUATION;

PLASMAS;

EID: 79551693118     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/1/015001     Document Type: Article

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