SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 158, Issue 3, 2011, Pages

Single-step RIE fabrication process of low loss InP waveguide using C H4 / H2 chemistry

(4) Lysevych, M a Tan, H H a Karouta, F a Jagadish, C a

a AUSTRALIAN NATIONAL UNIVERSITY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHED SURFACE; FABRICATION PROCESS; INP; LOW LOSS; PLASMA TREATMENT; RIDGE WAVEGUIDES; ROOT MEAN SQUARE ROUGHNESS; SINGLE-STEP; WAVEGUIDE PROPAGATION;

ELECTRIC LOSSES; PLASMA APPLICATIONS; WAVEGUIDES;

REACTIVE ION ETCHING;

EID: 79551576696 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3532767 Document Type: Article

Times cited : (9)

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