Selective etching and polymer deposition on InP surface in reactive ion etching with a mixture of methane and hydrogen

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages

  Yamamoto, Norio ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GRATING PATTERNS; HYDROGEN FLOW RATE; HYDROGEN RADICAL; INP; METHANE FLOW; PATTERNED SURFACE; POLYMER DEPOSITION; POLYMERIC SURFACES; SELECTIVE ETCHING; SURFACE CONFIGURATION;

HYDROGEN; METHANATION; METHANE; POLYMERS; SILICON COMPOUNDS; WINDOWS;

REACTIVE ION ETCHING;

EID: 72849152307     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3256228     Document Type: Conference Paper

References (22)

1. R. Cheung, S. Thoms, S. P. Beamont, G. Doughty, V. Law, and C. D. W. Wilkinson, Electron. Lett. 23, 857 (1987).
2. L. Henry and C. Vaudry, Electron. Lett. 23, 1253 (1987).
3. T. R. Hayes, M. A. Dreisbach, P. M. Thomas, W. C. Dautremont-Smith, and L. A. Heimbrook, J. Vac. Sci. Technol. B 7, 1130 (1989).
4. I. Adesida, E. Andideh, C. Jones, and N. Finnegan, Proceedings of the Second International Conference on InP and Related Materials, Denver, CO, 1990 (unpublished), p. 405.
5. V. J. Law, M. Tewordt, S. G. Ingram, and G. A. C. Jones, J. Vac. Sci. Technol. B 9, 1449 (1991).
6. J. W. McNabb, H. G. Craighead, H. Temkin, and R. A. Logan, J. Vac. Sci. Technol. B 9, 3535 (1991).
7. J. E. Schramm, D. Ginger Yu, J. J. Pekarik, E. L. Hu, and J. L. Merz, Proceedings of the Fourth International Conference on InP and Related Materials, Newport, RI, 1992 (unpublished), p. 351.
8. T. R. Hayes, W. C. Dautremont-Smith, H. S. Luftman, and J. W. Lee, Appl. Phys. Lett. 55, 56 (1989).
9. S. J. Pearton, U. K. Chakrabarti, and F. A. Baiocchi, Appl. Phys. Lett. 55, 1633 (1989).
10. T. R. Hayes, U. K. Chakrabarti, F. A. Baiocchi, A. B. Emerson, H. S. Luftman, and W. C. Dautremont-Smith, J. Appl. Phys. 68, 785 (1990).
11. K. Ohtsuka, T. Ohishi, Y. Abe, H. Sugimoto, and T. Matsui, J. Appl. Phys. 70, 2361 (1991).
12. K. Ohtsuka, H. Sugimoto, T. Isu, and T. Matsui, Jpn. J. Appl. Phys., Part 1 32, 4430 (1993).
13. E. L. Hu, D. G. Yu, C.-H. Chen, B. P. Keller, and A. L. Holmes, Jr., Proceedings of the Eighth International Conference on InP and Related Materials, Schwäbisch Gmünd, Germany, 1996 (unpublished), p. 107.
14. Th. Böttner, H. Kräutle, E. Kuphal, K. Miethe, and H. L. Hartnagel, Proceedings of the Eighth International Conference on InP and Related Materials, Schwäbisch Gmünd, Germany, 1996 (unpublished), p. 115.
15. N. Yamamoto, K. Kishi, S. Matsumoto, Y. Kadota, R. Iga, H. Okamoto, and H. Mawatari, J. Vac. Sci. Technol. B 15, 103 (1997).
16. E. Andideh, I. Adesida, and T. Brock, J. Vac. Sci. Technol. B 7, 1841 (1989).
17. T. Matsui, H. Sugimoto, T. Ohishi, Y. Abe, K. Ohtsuka, and H. Ogata, Appl. Phys. Lett. 54, 1193 (1989).
18. T. Matsui, K. Ohtsuka, H. Sugimoto, Y. Abe, and T. Ohishi, Appl. Phys. Lett. 56, 1641 (1990).
19. O. Kjebon, S. Lourdudoss, B. Hammarlund, S. Lindgren, M. Rask, P. Ojala, G. Landgren, and B. Broberg, Appl. Phys. Lett. 59, 253 (1991).
20. S. Matsumoto, M. Fukuda, K. Sato, Y. Itaya, and M. Yamamoto, Electron. Lett. 30, 1305 (1994).
21. M. Yamamoto, Y. Itaya, and T. Sugie, Proceedings of the Eighth International Conference on InP and Related Materials, Schwäbisch Gmünd, Germany, 1996 (unpublished), p. 376.
22. Y. Kondo, K. Kishi, M. Ito, H. Oohashi, Y. Itaya, and M. Yamamoto, Proceedings of the Eight International Conference on InP and Related Materials, Schwäbisch Gmünd, Germany, 1996 (unpublished), p. 384.