메뉴 건너뛰기




Volumn 37, Issue 3, 2000, Pages 241-246

Reactive ion etching of InP for optoelectronic device applications: Comparison in CH4, CH4/H2, and CH4/Ar gas

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0034337980     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (12)

References (20)
  • 18
    • 0001960269 scopus 로고
    • Ph.D. Dissertation, University of Illinois at Urbana-Champaign
    • E. Andideh, Ph.D. Dissertation, University of Illinois at Urbana-Champaign, 1990.
    • (1990)
    • Andideh, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.