CH4-based dry etching of high Q InP microdisks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 301-305

  Choi, Seung June ^a   Djordjev, Kostadin ^a   Choi, Sang Jun ^a   Dapkus, P Daniel ^a  

^a UNIVERSITY OF SOUTHERN CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; HIGH PRESSURE EFFECTS; METHANE; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM PHOSPHIDE;

MICRODISKS;

DRY ETCHING;

EID: 0036118805     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1445164     Document Type: Conference Paper

References (12)