Electrodeposition, characterization and morphological investigations of NiFe/Cu multilayers prepared by pulsed galvanostatic, dual bath technique

Materials Characterization

Volumn 62, Issue 2, 2011, Pages 204-210

  Esmaili, S ^a   Bahrololoom, M E ^a   Kavanagh, K L ^b  

^a SHIRAZ UNIVERSITY   (Iran)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Electrodeposition; NiFe Cu multilayers; Surface roughness

Indexed keywords

CONTINUOUS LAYERS; CU LAYERS; CU SUBSTRATE; DUAL BATHS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; GALVANOSTATIC MODE; GALVANOSTATICS; GRAIN SIZE; NIFE/CU MULTILAYERS; POLYCRYSTALLINE; PULSED ELECTRODEPOSITION; ROOT MEAN SQUARE ROUGHNESS; SCANNING ELECTRONS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ELECTRODEPOSITION; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

SURFACE ROUGHNESS;

EID: 79551496635     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2010.11.017     Document Type: Article

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