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Journal of Magnetism and Magnetic Materials

Volumn 165, Issue 1-3, 1997, Pages 280-283

Characterization of electrodeposited Co/Cu ultrathin films and multilayers

(3) Jyoko, Yukimi a Kashiwabara, Satoshi a Hayashi, Yasunori a

a KYUSHU UNIVERSITY (Japan)

Author keywords

Electrodeposition; Giant magnetoresistance; Multilayer; Reflection electron microscopy; Thin films

Indexed keywords

ANTIFERROMAGNETISM; COBALT ALLOYS; COPPER ALLOYS; ELECTRODEPOSITION; ELECTRON MICROSCOPY; FERROMAGNETISM; MAGNETORESISTANCE; METALLIC SUPERLATTICES; MONOLAYERS; PLATINUM; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; ULTRATHIN FILMS;

GIANT MAGNETORESISTANCE; OSCILLATORY ANTIFERROMAGNETIC INTERLAYER COUPLING;

MAGNETIC THIN FILMS;

EID: 0030784346 PISSN: 03048853 EISSN: None Source Type: Journal
DOI: 10.1016/S0304-8853(96)00529-X Document Type: Article

Times cited : (16)

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