Field emission characteristics of thin-metal-coated nano-sheet carbon films

Applied Surface Science

Volumn 257, Issue 7, 2011, Pages 2455-2460

  Gu, Guang Rui ^a   Ito, Toshimichi ^b  

^a YANBIAN UNIVERSITY   (China)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Field emission; Microwave plasma CVD; Nano sheet carbon films; Space charge limited current

Indexed keywords

ALUMINUM COATINGS; CARRIER TRANSPORT; E REGION; ELECTRIC CONDUCTIVITY; ELECTRIC FIELDS; FIELD EMISSION; METALS; MICROWAVE TUBES; MICROWAVES; NANOSHEETS; PLASMA CVD; SHEET METAL; SILICON WAFERS;

CHEMICAL VAPOUR DEPOSITION; ELECTRON BEAM EVAPORATION METHODS; FIELD-EMISSION CHARACTERISTICS; FOWLER-NORDHEIM; HYDROGEN METHANE GAS MIXTURES; MICROWAVE PLASMA; MICROWAVE PLASMA CVD; SPACE CHARGE LIMITED CURRENTS;

CARBON FILMS;

EID: 79251599660     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.10.002     Document Type: Article

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