Field emission properties of nano-structured carbon films with carbon needles deposited on Si using high-power-density microwave-plasma CVD method

Diamond and Related Materials

Volumn 17, Issue 4-5, 2008, Pages 817-821

  Gu, Guang rui ^a   Ito, Toshimichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Carbon films; Field emission; MWPCVD; Nano structure

Indexed keywords

FIELD EMISSION; NANOSTRUCTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS;

CARBON NEEDLES; MICROWAVE PLASMA CVD;

CARBON FILMS;

EID: 42949146129     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.015     Document Type: Article

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