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Volumn 19, Issue 5-6, 2010, Pages 586-589

Enhanced field emission properties from titanium-coated carbon nanotubes

Author keywords

Carbon nanotube; Field emission; PECVD; Titanium coating

Indexed keywords

AS-GROWN; DC PLASMA; EMISSION CURRENT DENSITY; EMISSION PERFORMANCE; EMISSION UNIFORMITY; ENHANCED FIELD EMISSION; FIELD EMISSION APPLICATION; FIELD-EMISSION CHARACTERISTICS; ICP-CVD; LOW WORK FUNCTION; METAL POSTS; PECVD; RESISTANCE CONTACT; SCREENING EFFECT; SPUTTERING METHODS; TI COATING; TITANIUM COATING; TURN-ON FIELD; VERTICALLY ALIGNED;

EID: 77950370674     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.11.021     Document Type: Article
Times cited : (32)

References (16)
  • 11
    • 33744938714 scopus 로고
    • Lattice Press, California
    • Wolf S. Silicon Processing for the VLSI Era. Process Integration vol. 2 (1990), Lattice Press, California
    • (1990) Process Integration , vol.2
    • Wolf, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.