Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B

Volumn 17, Issue 4, 2008, Pages 1467-1471

  Gu, Guang Rui ^a   Jin, Zhe ^a   Toshimichi, Ito ^b  

^a YANBIAN UNIVERSITY   (China)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Carbon films; Field emission; Microwave plasma chemical vapour deposition; Nano sheet

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; NANOSTRUCTURED MATERIALS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

FE CURRENTS; FIELD EMISSION SCANNING ELECTRON MICROSCOPE (FESEM); NANO-SHEET CARBON FILMS; THRESHOLD FIELDS;

CARBON FILMS;

EID: 42449148280     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/17/4/053     Document Type: Article

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