SCOPUS 정보 검색 플랫폼

Volumn 9, Issue 11, 2000, Pages 1876-1880

Effect of annealing on electron field emission properties of hydrogen-free amorphous carbon films

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CARBON; DEPOSITION; DOPING (ADDITIVES); ELECTRON EMISSION; SEMICONDUCTING SILICON;

FILTERED ARC DEPOSITIONS (FAD); HYDROGEN-FREE AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0034320907 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(00)00337-X Document Type: Article

Times cited : (11)

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