Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition

Chinese Physics B

Volumn 17, Issue 2, 2008, Pages 716-720

  Gu, Guang Rui ^a   Wu, Bao Jia ^a   Jin, Zhe ^a   Ito, Toshimichi ^b  

^a YANBIAN UNIVERSITY   (China)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Carbon films; Field emission; Microwave plasma chemical vapour deposition; Nano catkin

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; FIELD EMISSION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE MORPHOLOGY;

ELECTRON FIELD EMISSION; FOWLER-NORDHEIM THEORY; NANO CATKIN;

CARBON FILMS;

EID: 43649092744     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/17/2/059     Document Type: Article

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