Structural properties of pulsed laser deposited SnO x thin films

Applied Surface Science

Volumn 257, Issue 7, 2011, Pages 2520-2525

  Fazio, E ^a   Neri, F ^a   Ruggeri, R ^a   Sabatino, G ^a   Trusso, S ^b   Mannino, G ^c  

^a UNIVERSITY OF MESSINA   (Italy)

^b CNR   (Italy)

^c CNR IMM   (Italy)

Author keywords

Pulsed laser ablation; TEM; Thin films; Tin oxide

Indexed keywords

ELECTRON DIFFRACTION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LASER ABLATION; LASER PRODUCED PLASMAS; NANOCRYSTALS; NANOPARTICLES; OXIDE FILMS; OXIDE MINERALS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PULSED LASER DEPOSITION; SHOCK WAVES; STRUCTURAL PROPERTIES; TEMPERATURE; THIN FILMS; TIN OXIDES; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CORE LEVEL PHOTOEMISSION SPECTROSCOPY; CRYSTALLINE STRUCTURE; CRYSTALLOGRAPHIC AXES; LASER INDUCED PLASMA; NANO-CRYSTALLINE STRUCTURES; NANOPARTICLES SIZES; SELECTED AREA ELECTRON DIFFRACTION; STOICHIOMETRIC FILMS;

PULSED LASERS;

EID: 79251598325     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.10.015     Document Type: Article

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