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Volumn 257, Issue 7, 2011, Pages 2428-2431
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Structure, electrical and optical properties of TiN x films by atmospheric pressure chemical vapor deposition
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Author keywords
Atmospheric pressure chemical vapor deposition; Nitride composition; Optical properties; Structure; Titanium nitride
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Indexed keywords
ATMOSPHERIC CHEMISTRY;
ATMOSPHERIC PRESSURE;
ATMOSPHERIC STRUCTURE;
CHEMICAL VAPOR DEPOSITION;
CHLORINE COMPOUNDS;
OPTICAL PROPERTIES;
STRUCTURE (COMPOSITION);
SUBSTRATES;
TITANIUM NITRIDE;
ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION;
ELECTRICAL AND OPTICAL PROPERTIES;
GLASS SUBSTRATES;
LINEAR RELATIONSHIPS;
SHARP INCREASE;
TRANSITION POINT;
TRANSITION WAVELENGTHS;
TRANSMISSION BAND;
OPTICAL FILMS;
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EID: 79251595265
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2010.11.180 Document Type: Review |
Times cited : (25)
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References (23)
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