메뉴 건너뛰기




Volumn 257, Issue 7, 2011, Pages 2428-2431

Structure, electrical and optical properties of TiN x films by atmospheric pressure chemical vapor deposition

Author keywords

Atmospheric pressure chemical vapor deposition; Nitride composition; Optical properties; Structure; Titanium nitride

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERIC STRUCTURE; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; OPTICAL PROPERTIES; STRUCTURE (COMPOSITION); SUBSTRATES; TITANIUM NITRIDE;

EID: 79251595265     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.180     Document Type: Review
Times cited : (25)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.