CVD TiN layers as diffusion barrier films on porous SiO2 aerogel

Microelectronic Engineering

Volumn 70, Issue 2-4, 2003, Pages 330-336

  Bonitz, J ^a   Schulz, S E ^a   Gessner, T ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Aerogel; CVD; Diffusion barrier; Low k dielectric; TiN

Indexed keywords

AEROGELS; DIFFUSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICA;

DIFFUSION BARRIERS;

TITANIUM NITRIDE;

EID: 0142011537     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00431-3     Document Type: Conference Paper

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