Köhler illumination analysis for high-resolution optical metrology using 193 nm light

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 3, 2007, Pages

  Sohn, Yeung Joon ^a   Silver, Richard M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

193 nm; High resolution optical metrology; K hler factor; K hler illumination; Linewidth profile

Indexed keywords

HIGH RESOLUTION OPTICAL METROLOGY; ILLUMINATION ANALYSIS; ILLUMINATION BEAMS; LINE TARGETS;

EXCIMER LASERS; LINEWIDTH; OPTICAL SYSTEMS; WAVEFRONTS; WAVELENGTH;

OPTICAL VARIABLES MEASUREMENT;

EID: 35148858951     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714890     Document Type: Conference Paper

References (5)

1. R. M. Silver, R. Attota, M. Stocker, M. Bishop, J. Jun, E. Marx, M. Davidson, and R. Larrabee, "High-resolution optical overlay metrology," Proc. SPIE, Vol. 5375, pp. 78-94 (2004).
2. R.M. Silver, R. Attota, M. Stocker, M. Bishop, L. Howard, T. Germer, E. Marx, M. Davidson, and R. Larrabee, "High-resolution optical metrology," Proc. SPIE, Vol. 5752, pp. 67-79 (2005).
3. J. M. Pedulla, J. Potzick, and R. Silver, "Improving the uncertainty of photomask linewidth measurements," Proc. SPIE, Vol. 5375, pp. 317-327 (2004).
4. R. Attota, R. M. Silver, M. R. Bishop, and R. Dixon, "Optical critical dimension measurement and illumination analysis using through-focus focus metric," Proc. SPIE, Vol. 6152 (2006) to be published.
5. Y J. Sohn, B. M. Barnes, L. Howard, R. M. Silver, R. Attota, and M. T. Stocker, "Köhler illumination in highresolution optical metrology," Proc. SPIE, Vol. 6152, pp. 61523S (2006).