Results of an international photomask linewidth comparison of NIST and PTB

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Bodermann, B ^a   Bergmann, D ^a   Buhr, E ^a   Hassler Grohne W ^a   Bosse, H ^a   Potzick, J ^b   Dixson, R ^b   Quintanilha, R ^b   Stocker, M ^b   Vladar, A ^b   Orji, N G ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

CD metrology; International comparison; Linewidth; MRA; Nano 1; Photomask; Uncertainty components

Indexed keywords

CD-METROLOGY; INTERNATIONAL COMPARISON; MRA; NANO 1; UNCERTAINTY COMPONENTS;

LINEWIDTH; STANDARDS; UNCERTAINTY ANALYSIS; UNITS OF MEASUREMENT;

PHOTOMASKS;

EID: 79251470054     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.831373     Document Type: Conference Paper

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