Thin film oxide barrier layers: Protection of kapton from space environment by liquid phase deposition of titanium oxide

ACS Applied Materials and Interfaces

Volumn 2, Issue 7, 2010, Pages 1835-1843

  Gouzman, Irina ^a   Girshevitz, Olga ^b   Grossman, Eitan ^a   Eliaz, Noam ^c   Sukenik, Chaim N ^b  

^a Soreq NRC ^*  (Israel)

^b BAR ILAN UNIVERSITY   (Israel)

^c TEL AVIV UNIVERSITY   (Israel)

Author keywords

atomic oxygen; liquid phase deposition; space environment; titania

Indexed keywords

AMBIENT CONDITIONS; AQUEOUS SOLUTIONS; ATOMIC OXYGEN; BARRIER LAYERS; BORIC ACIDS; ELECTROSTATIC FORCE MICROSCOPY; EROSION YIELD; EXTERNAL SURFACES; FLUENCES; FLUORIDE COMPLEXES; IN-SITU; KAPTON POLYIMIDE; LIQUID-PHASE DEPOSITION; LOW-EARTH ORBIT; OXIDE COATING; RF PLASMA; RUTHERFORD BACK-SCATTERING; SEM; SPACE ENVIRONMENT; SURFACE EROSION; SURFACE HARDNESS; THERMO-OPTICAL PROPERTIES; THIN FILM OXIDES; TITANIA COATINGS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; DEPOSITION; ELECTRIC FURNACES; ELECTROSTATIC DEVICES; ELECTROSTATIC DISCHARGE; ELECTROSTATIC FORCE; INORGANIC ACIDS; LIQUIDS; NANOINDENTATION; NEMATIC LIQUID CRYSTALS; OPTICAL PROPERTIES; ORBITS; OXIDE MINERALS; OXYGEN; POLYIMIDES; PROTECTIVE COATINGS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TITANIUM PLATING; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC FORCE MICROSCOPY;

EID: 79151478599     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100113t     Document Type: Article

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