Optical and field-emission properties of ZnO nanostructures deposited using high-pressure pulsed laser deposition

ACS Applied Materials and Interfaces

Volumn 2, Issue 10, 2010, Pages 2863-2869

  Premkumar, T ^a   Zhou, Y S ^b   Lu, Y F ^b   Baskar, K ^a  

^a ANNA UNIVERSITY   (India)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

high pressure pulsed laser deposition; nanorod field emission properties; nanowalls; optical properties; zinc oxide

Indexed keywords

BAND EMISSION; CRYSTALLINITIES; EMISSION PERFORMANCE; FIELD ENHANCEMENT FACTOR; FIELD-EMISSION PROPERTIES; FLUORESCENCE SPECTRA; GAN SUBSTRATE; GROWTH MECHANISMS; HIGH ASPECT RATIO; HIGH CURRENT DENSITIES; HIGH-PRESSURE PULSED LASER DEPOSITION; MICRO-RAMAN SPECTRA; NANOWALLS; NON-POLAR; SI (100) SUBSTRATE; SI SUBSTRATES; TURN-ON FIELD; VERTICAL ALIGNMENT; VERTICALLY ALIGNED; VIBRATION MODES; ZNO; ZNO NANOROD; ZNO NANOSTRUCTURES; ZNO NANOWALLS; ZNO STRUCTURES;

ALUMINUM; ASPECT RATIO; FIELD EMISSION; GALLIUM ALLOYS; GALLIUM NITRIDE; NANORODS; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SILICON; SUBSTRATES; ZINC; ZINC OXIDE;

PULSED LASERS;

NANOTUBE; ZINC OXIDE;

ARTICLE; LASER; OPTICS;

LASERS; NANOTUBES; OPTICS AND PHOTONICS; ZINC OXIDE;

EID: 79151471099     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100539q     Document Type: Article

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