Influence of TaCl 5 partial pressure on texture structure of TaC coating deposited by chemical vapor deposition

Applied Surface Science

Volumn 257, Issue 9, 2011, Pages 4044-4050

  Chen, Zhao Ke ^a   Xiong, Xiang ^a   Long, Ying ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Preferential orientation; Surface morphology; TaC

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; DIFFUSION COATINGS; MICROSTRUCTURE; PARTIAL PRESSURE; PROCESS CONTROL; REACTION KINETICS; SURFACE MORPHOLOGY; SURFACE REACTIONS; X RAY DIFFRACTION;

DIFFUSION KINETICS; DIFFUSION-CONTROLLED PROCESS; FORMATION MECHANISM; GAS SUPERSATURATION; GRAPHITE SUBSTRATE; PREFERENTIAL ORIENTATION; SCANNING ELECTRONIC MICROSCOPY; SECONDARY NUCLEATION;

CHLORINE COMPOUNDS;

EID: 78951473876     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.172     Document Type: Article

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