Effect of environment and heat treatment on the optical properties of RF-sputtered SnO2 thin films

Physica B: Condensed Matter

Volumn 406, Issue 4, 2011, Pages 812-817

  Saipriya, S ^a   Sultan, M ^a   Singh, R ^a  

^a UNIVERSITY OF HYDERABAD   (India)

Author keywords

Electronic ceramics; Optical properties; RF magnetron sputtering; Thin films

Indexed keywords

AS-DEPOSITED FILMS; BAND GAPS; ELECTRONIC CERAMIC; GAS CONTENT; IN-BAND; OPTICAL PARAMETER; OSCILLATORY BEHAVIORS; OXYGEN DEFECT; PROCESS GAS ENVIRONMENTS; QUARTZ SUBSTRATE; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SPUTTERING GAS; TRANSMITTANCE SPECTRA; URBACH ENERGY; XRD PATTERNS;

AMORPHOUS FILMS; CERAMIC MATERIALS; ENERGY GAP; MAGNETRON SPUTTERING; OXYGEN; QUARTZ; REFRACTIVE INDEX; THIN FILMS;

OPTICAL FILMS;

EID: 78751644137     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2010.12.003     Document Type: Article

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