Photoresist etching using Ar/O2 and He/O2 atmospheric pressure plasma

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2295-2302

  Jung, Mi Hee ^a   Choi, Ho Suk ^a  

^a Chungnam National University   (South Korea)

Author keywords

Dielectrics; Etching; Glow discharge; Surface roughness

Indexed keywords

DIELECTRIC MATERIALS; ETCHING; GLOW DISCHARGES; HYDROPHILICITY; OXYGEN; PHOTORESISTS; SILICON WAFERS; SURFACE ROUGHNESS;

ATMOSPHERIC PRESSURE PLASMA; PLASMA DISCHARGES; RADIO FREQUENCY (RF) POWER;

PLASMAS;

EID: 33750910916     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.030     Document Type: Article

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