Effect of the oxygen partial pressure on the microstructure and optical properties of ZnO:Cu films

Vacuum

Volumn 85, Issue 7, 2011, Pages 744-748

  Tao, Y M ^a   Ma, S Y ^a   Chen, H X ^a   Meng, J X ^a   Hou, L L ^a   Jia, Y F ^a   Shang, X R ^a  

^a NORTHWEST NORMAL UNIVERSITY   (China)

Author keywords

Optical properties; Radio frequency magnetron sputtering; X ray diffraction; ZnO:Cu thin films

Indexed keywords

CU FILMS; CU THIN FILM; EFFECT OF OXYGEN; FLUORESCENCE SPECTROPHOTOMETER; GRAIN ORIENTATION; OXYGEN PARTIAL PRESSURE; PL SPECTRA; RADIO FREQUENCY MAGNETRON SPUTTERING; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING; ROOM TEMPERATURE; SI SUBSTRATES; VIOLET EMISSION; ZNO;

ATOMIC FORCE MICROSCOPY; COPPER; DIFFRACTION; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; PARTIAL PRESSURE; POSITIVE IONS; PRESSURE EFFECTS; RADIO; RADIO WAVES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS; ZINC OXIDE;

OPTICAL FILMS;

EID: 78751581810     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.11.009     Document Type: Article

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