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Electrochemical and Solid-State Letters

Volumn 14, Issue 1, 2011, Pages

Formation of nano-crystalline ru-based ternary thin films by plasma-enhanced atomic layer deposition

(5) Eom, Tae Kwang a Kim, Soo Hyun a Park, Kye Sun b Kim, Sunjung b Kim, Hoon c

a Yeungnam University (South Korea)

b University of Ulsan (South Korea)

c APPLIED MATERIALS INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; COLUMNAR GRAIN; HIGH-RESOLUTION TEM ANALYSIS; NANOCRYSTALLINES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POLYCRYSTALLINE; RU FILM; RUTHERFORD BACK-SCATTERING SPECTROMETRY; SECTIONAL VIEWS; SUBCYCLES; TEM;

AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLASMA DEPOSITION; RUTHENIUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON NITRIDE; THIN FILMS; VAPOR DEPOSITION;

COPPER;

EID: 78751551054 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3506398 Document Type: Article

Times cited : (18)

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