Effect of indium dop ing on zinc oxide films prepared by chemical spray pyrolysis technique

Bulletin of Materials Science

Volumn 33, Issue 5, 2010, Pages 581-587

  Singh, Girjesh ^a   Shrivastava, S B ^a   Jain, Deepti ^b   Pandya, Swati ^b   Shripathi, T ^b   Ganesan, V ^b  

^a VIKRAM UNIVERSITY   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

Chemical spray pyrolysis technique; ZnO; ZnO : In

Indexed keywords

CONDUCTIVE FILMS; CRACKING (CHEMICAL); INDIUM; LIGHT POLARIZATION; OPTICAL PROPERTIES; PYROLYSIS; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; SURFACE ROUGHNESS; X RAY DIFFRACTION; ZINC OXIDE;

CHEMICAL SPRAY PYROLYSIS; CRYSTALLINE QUALITY; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRON CONCENTRATION; INDIUM CONCENTRATION; PREFERENTIAL GROWTH; RESISTIVITY VALUES; X-RAY DIFFRACTION TECHNIQUES;

OXIDE FILMS;

EID: 78651496537     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-010-0089-6     Document Type: Article

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