Al-doped zinc oxide (ZnO:Al) thin films by pulsed laser ablation

Journal of the Indian Institute of Science

Volumn 81, Issue 5, 2001, Pages 527-533

  Singh, A V ^a   Kumar, Manoj ^a   Mehra, R M ^a   Wakahara, Akihiro ^b   Yoshida, Akira ^b  

^a UNIVERSITY OF DELHI   (India)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DOPING (ADDITIVES); EXCIMER LASERS; PULSED LASER DEPOSITION; ZINC OXIDE;

PULSED LASER ABLATION;

THIN FILMS;

EID: 0042318637     PISSN: 09704140     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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