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Volumn 509, Issue 5, 2011, Pages 2176-2179
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Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates
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Author keywords
AFM; Atomic force microscopy; Electronic properties; Optical properties; Oxide materials; Thin films; X ray diffraction
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Indexed keywords
AFM;
AG FILMS;
ATOMIC FORCE;
ELECTRICAL PROPERTY;
GLASS SUBSTRATES;
HIGH-EFFICIENCY SOLAR CELLS;
ISLAND STRUCTURE;
OXIDE MATERIALS;
POTENTIAL APPLICATIONS;
TRANSPARENT CONDUCTING ELECTRODES;
ATOMIC FORCE MICROSCOPY;
CONDUCTIVE FILMS;
DIFFRACTION;
ELECTRIC PROPERTIES;
ELECTRONIC PROPERTIES;
FILM PREPARATION;
GLASS;
MATERIALS PROPERTIES;
MULTILAYERS;
OPTICAL FILMS;
OPTICAL PROPERTIES;
OXIDE FILMS;
SILVER;
SUBSTRATES;
X RAY DIFFRACTION;
X RAYS;
MULTILAYER FILMS;
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EID: 78651353930
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2010.10.180 Document Type: Article |
Times cited : (24)
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References (22)
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