Pseudo-rhombus-shaped subwavelength crossed gratings of GaAs for broadband antireflection

Chinese Physics Letters

Volumn 27, Issue 12, 2010, Pages

  Chen, Xi ^a   Fan, Zhong Chao ^a   Zhang, Jing ^a   Song, Guo Feng ^a   Chen, Liang Hui ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; III-V SEMICONDUCTORS; PHOTORESISTS; SEMICONDUCTING GALLIUM;

BROADBAND ANTIREFLECTION; CROSSED GRATINGS; DRY ETCHING PROCESS; GAAS SUBSTRATES; HOLOGRAPHIC LITHOGRAPHY; MOTH-EYE STRUCTURE; NON-LINEAR RESPONSE; PHOTORESIST MASK; SPECTRAL REFLECTANCES; SUB-WAVELENGTH;

GALLIUM ARSENIDE;

EID: 78650977831     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/27/12/124210     Document Type: Article

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