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Volumn 44, Issue 12, 2010, Pages 1611-1616

Formation and crystallization of silicon nanoclusters in SiNx:H films using femtosecond pulsed laser annealings

(3) Korchagina, T T a Volodin, V A a,b Chichkov, B N c

a INSTITUTE OF SEMICONDUCTOR PHYSICS (Russian Federation)

b NOVOSIBIRSK STATE UNIVERSITY (Russian Federation)

c LASER ZENTRUM HANNOVER E V (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 78650651835 PISSN: 10637826 EISSN: None Source Type: Journal
DOI: 10.1134/S1063782610120146 Document Type: Article

Times cited : (6)

References (14)

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