SCOPUS 정보 검색 플랫폼

Procedia Engineering

Volumn 5, Issue , 2010, Pages 1148-1151

An ALD etch-back method to fabricate high aspect ratio nanopillar arrays for photonic crystal sensors

(3) Huang, Yujian a Pandraud, Grégory a Sarro, Pasqualina M a

a DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

ALD; Hard materials; High aspect ratio; Photonic crystal sensors

Indexed keywords

ATOMIC LAYER DEPOSITION; DEPOSITION; HARDNESS; NANOSTRUCTURES; PHOTONIC CRYSTALS; PLASMA ETCHING; TITANIUM DIOXIDE;

DENSE ARRAYS; ETCH-BACK TECHNIQUE; FUNCTIONAL SURFACES; HARD MATERIAL; HIGH ASPECT RATIO; NANO-PILLAR ARRAYS; PHOTONIC CRYSTAL SENSORS; PRECISE CONTROL;

ASPECT RATIO;

EID: 78650602810 PISSN: None EISSN: 18777058 Source Type: Conference Proceeding
DOI: 10.1016/j.proeng.2010.09.314 Document Type: Conference Paper

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.