The FTIR studies on the structural and electrical properties of SnO2: F films as a function of hydrofluoric acid concentration

Optoelectronics and Advanced Materials, Rapid Communications

Volumn 4, Issue 8, 2010, Pages 1158-1162

  Zhang, Bo ^a,b   Tian, Yun ^b   Zhang, Jianxin ^a,b   Cai, Wei ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b SHANDONG UNIVERSITY   (China)

Author keywords

Carrier; Spray pyrolysis; Substitution of fluorine for oxygen; Tin oxide films

Indexed keywords

CARRIER CONCENTRATION; HYDROFLUORIC ACID; IONS; NANOCOMPOSITES; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; TIN OXIDES;

ACID CONCENTRATIONS; CARRIER; ELECTRICAL PARAMETER; FILM ORIENTATIONS; FLUORINE-DOPED TIN OXIDE FILMS; INTERSTITIAL SITES; SCATTERING CENTERS; STRUCTURAL AND ELECTRICAL PROPERTIES;

OXIDE FILMS;

EID: 78650348070     PISSN: 18426573     EISSN: 20653824     Source Type: Journal    
DOI: None     Document Type: Article

References (25)

1. E. Fortunato, D. Ginely, H. Hosono, D. C. Paine, MRS Bull. 32, 242-247 (2007).
2. A. V. Moholkar, S. M. Pawar, K. Y. Rajpure, C. H. Bhosale, J. H. Kim, Applied Surface Science 23, 9358-9364 (2009).
3. E. Kuantama, D. W. Han, Y. M. Sung, J. E. Song, C. H. Han, Thin Solid Films. Thin Solid Films 517, 4211-4214 (2009).
4. S. K. Ghandhi, R. Siviy, J. M. Borrego, Appl. Phys. Lett. 34, 833-836 (1979).
5. C. Schaefer, G. Brauer, J. Szczyrbowski, Surface and Coatings Technology. 93, 37-45(1997).
6. C. G. Fonstad, R. H. Rediker, Journal of Applied Physics. 42, 2911(1971).
7. J. R. Brown, P. W. Haycock, L. M. Smith, A. C. Jones, E. W. Williams. Sensor Actuators B 63,109-114 (2000).
8. S. Boycheva, A. K. Sytchkova, M. L. Grilli, A. Piegari, Thin Solid Films 515, 8469-8473 (2007).
9. A. N. Banerjee, S. Kundoo, P. Saha, K. K. Chattopadhyay. Journal of Sol-gel Science and Technology 28, 105 (2003).
10. K. Omura, P. Velucham, M. Tsuji, T. Nihio, M. Murozono. Journal of Electrochemistry Society. 146, 2113-2116 (1999).
11. J. H. Kim, K. A. Jeon, G. H. Kim, S. Y. Lee. Applied Surface Science. 252, 4834-4837 (2006).
12. J. J. Berry, D. S. Ginley, P. E. Burrows, Applied Physics Letter. 92, 193304-193307 (2008).
13. M. Ruske, G. Brauer, J. Szczyrbowski, Thin Solid Films 351, 146-150 (1999).
14. G. C. Morris, A. E. McElnea, Applied Surface Science 92, 167~199 (1996).
15. E. Elangovan, M. P. Singh, K. Ramamurthi, Materials Science and Engineering B 113, 143-148 (2004).
16. M. Kojima, H. Kato, M. Gatto, Philos. Mag. B 73, 277 (1996).
17. M. Kojima, H. Kato, Philos. Mag. B 73, 289 (1996).
18. D. J. Goyal, Chitra Agashe, B. R. Marathe, M. G. Takwale, V. G. Bhide. J. Appl. Phys. 73, 7520-7523 (2002).
19. A. Smith, J. M. Laurent, D. S. Smith, J. P. Bonnet, R. R. Clemente, Thin Solid Films 266,20-30 (1995).
20. Endrowednes Kuantama, Deok-Woo Han, Youl-Moon Sung, Jae-Eun Song, Chi-hwan Han, Thin Solid Films. 517, 4211-4214 (2009).
21. E. Elangovan, K. Ramamurthi, Applied Surface Science 249, 183-196 (2005).
22. E. Elangovan, K. Ramesh, K. Ramamurthi, Solid State Communications 130, 523-527 (2004).
23. J. J. Ph. Elich, E. C. Boslooper, H. Haitjema, Thin Solid Films 177, 17-33 (1989).
24. B. Thangaraju, Thin Solid Films 402, 71-78 (2002).
25. A. S. Gilmore, A. Al-Kaoud, V. Kaydanov, T. R. Ohno, Mate. Res. Soc. Symp. Proc. 666, F3.10.1 (2001).