Controlling precursor stability and evaporation through molecular design. Pseudo single source precursor approach to MOCVD SrTiO 3 thin films

Applied Surface Science

Volumn 257, Issue 6, 2011, Pages 2281-2290

  Seisenbaeva, Gulaim A ^a   Gohil, Suresh ^a   Kessler, Vadim G ^a   Andrieux, Michel ^b   Legros, Corinne ^b   Ribot, Patrick ^b   Brunet, M ^c,d   Scheid, E ^c,d  

^a SWEDISH UNIVERSITY OF AGRICULTURAL SCIENCES   (Sweden)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c LAAS CNRS   (France)

^d UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

Deposition optimization; Gas phase behaviour; Solution stability; Strontium titanate (STO); Volatility studies

Indexed keywords

DEPOSITION; DIELECTRIC MATERIALS; EVAPORATION; FILM PREPARATION; GATE DIELECTRICS; MULTIVARIANT ANALYSIS; STRONTIUM TITANATES; THIN FILMS;

EXPERIMENTAL CONDITIONS; GASPHASE; HIGH QUALITY COATINGS; SINGLE-SOURCE PRECURSOR; SOLUTION STABILITY; TITANIUM ALKOXIDES; VOLATILE PRECURSORS; VOLATILITY STUDIES;

TITANIUM COMPOUNDS;

EID: 78650269216     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.09.090     Document Type: Article

References (28)

1. B. Su, T. Button, T. Price, D. Iddles, and D. Cannell Journal of Materials Science 43 2008 847
2. J. Pena, A. Martinez, F. Conde, J.M. Gonzalez-Calbet, and M. Vallet-Regi Solid State Ionics 101-103 1997 183
3. D. Kil, J. Lee, and J. Roh Chemical Vapor Deposition 8 2002 195
4. R. Thomas, R. Bhakta, P. Ehrhart, R.A. Fischer, R. Waser, and A. Devi Surface and Coatings Technology 201 2007 9135
5. V.K. Kessler Chemical Communications 11 2003 1213
6. V.K. Kessler, L.G. Hubert-Pfalzgraf, S. Daniele, and A. Gleizes Chemistry of Materials 6 1994 2336
7. G.A. Seisenbaeva, S. Gohil, and V.K. Kessler Journal of Materials Chemistry 14 2004 3177
8. V.K. Kessler, G.I. Spijksma, G.A. Seisenbaeva, S. Hkansson, D.H.A. Blank, and H.J.M. Bouwmeester Journal of Sol-Gel Science and Technology 40 2006 163
9. M. Andrieux, C. Gasqueres, C. Legros, I. Gallet, M. Herbst-Ghysel, M. Condat, V.K. Kessler, G.A. Seisenbaeva, O. Heintz, and Poissonnet Applied Surface Science 253 2007 9091
10. A.A. Tahir, M. Mazhar, M. Hamid, K.G.U. Wijayantha, and K.C. Molloy Dalton Transactions 2009 3674
11. L.G. Hubert-Pfalzgraf, S. Daniele, J.M. Decams, and J. Vaissermann Journal of Sol-Gel Science and Technology 8 1997 49
12. V.K. Kessler, G.A. Seisenbaeva, R. Pazik, and W. Strek Dalton Transactions 2008 3412
13. N.Y. Turova, V.G. Kessler, and S.I. Kucheiko Polyhedron 10 1991 2617
14. R. Pazik, R. Tekoriute, S. Hkansson, R. Wiglusz, W. Strek, G.A. Seisenbaeva, Y.K. Gun'ko, and V.K. Kessler Chemistry-A European Journal 15 2009 6820
15. R.J. Errington, J. Ridland, W. Clegg, R.A. Coxall, and J.M. Sherwood Polyhedron 17 1998 659
16. U. Schubert, H. Buhler, and B. Hirle Chemische Berichte 125 1992 999
17. V.G. Kessler, G.A. Seisenbaeva, and S. Gohil Surface and Coatings Technology 201 2007 9082
18. R. Pazik, G.A. Seisenbaeva, S. Gohil, R. Wiglusz, L. Kepinski, W. Strek, and V.G. Kessler Inorganic Chemistry 49 2010 2684
19. J.M. Gaskell, A.C. Jones, H.C. Aspinall, S. Przybylak, P.R. Chalker, K. Black, H.O. Davies, P. Taechakumput, S. Taylor, and G.W. Critchlow Journals of Materials Chemistry 16 2006 3854
20. N. Kuzmina, I. Malkerova, A. Alikhanyan, D. Tsymbarenko, K. Lyssenko, O. Kreinin, G. Shuster, E. Lakin, and E. Zolotoyabko Chemical Vapor Deposition 15 2009 342
21. S. Lim, B. Choi, Y. Min, D. Kim, I. Yoon, S.S. Lee, and I. Lee Journal of Organometallic Chemistry 689 2004 224
22. A. Kosola, M. Putkonen, L. Johansson, and L. Niinisto Applied Surface Science 211 2003 102
23. O. Bernard, A.M. Huntz, M. Andrieux, W. Seiler, V. Ji, and S. Poissonnet Applied Surface Science 253 2007 4626
24. M. Andrieux, V. Viallet, M. Le Stum, L. Rapenne, M. Ghysel, C. Haut, and M. Condat Applied Surface Science 222 2004 351
25. W.H. Ma, P. Schäfer, P. Ehrhart, and R. Waser Integrated Ferroelectrics 30 2000 139
26. J. Legrand, S. Lhostis, Y. Chang, L. Militaru, C. Lamard, A. Sibai, L. Auvray, M. Audier, J.P. Senateur, C. Dubourdieu, and F. Ducroquet Microelectronic Engineering 72 2004 310
27. A. Sibai, S. Lhostis, Y. Rozier, O. Salicio, S. Amtablian, C. Dubois, J. Legrand, J.P. Sénateur, M. Audier, L. Hubert-Pfalzgraff, C. Dubourdieu, and F. Ducroquet Microelectronics and Reliability 45 5-6 2005 941
28. J. McPherson, J.Y. Kim, A. Shanware, and H. Mogul Applied Physics Letters 82 13 2003 2121