Pulsed corona plasma source characterization for film deposition on the inner surface of tubes

Journal of Physics D: Applied Physics

Volumn 43, Issue 49, 2010, Pages

  Pothiraja, Ramasamy ^a   Bibinov, Nikita ^a   Awakowicz, Peter ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE SPECIES; CHARACTERISTIC EMISSION; CHEMICAL KINETICS; CHEMICAL VAPOUR DEPOSITION; DIFFERENT MODES; ELECTRON DENSITIES; ELECTRON VELOCITY DISTRIBUTION FUNCTIONS; FILM DEPOSITION; GAS TEMPERATURE; GROWTH PROCESS; INNER DIAMETERS; INNER SURFACES; LONG TUBES; MICRO-PLASMA JET; OUTER DIAMETERS; PLASMA FILAMENTS; POSITIVE CORONA; PULSED CORONA; QUARTZ TUBES; SOURCE CHARACTERIZATION;

ARGON; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DISCHARGE (FLUID MECHANICS); DISSOCIATION; DISTRIBUTION FUNCTIONS; ELECTRIC CORONA; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FILM GROWTH; GROWTH KINETICS; METHANE; NITROGEN; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; QUARTZ;

TUBES (COMPONENTS);

EID: 78650163925     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/49/495201     Document Type: Article

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