Batch wafer scale fabrication of passivated carbon nanotube transistors for electrochemical sensing applications

Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

  Martin Fernandez, I ^a   Borrise X ^a,b   Lora Tamayo, E ^a   Godignon, P ^a   Perez Murano, F ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBE FIELD EFFECT TRANSISTORS; CHEMICAL VAPOR DEPOSITION; MICROELECTRONICS; PHOTOLITHOGRAPHY; SINGLE-WALLED CARBON NANOTUBES (SWCN); YARN;

CARBON NANOTUBE TRANSISTORS; CHEMICAL VAPOUR DEPOSITION; ELECTROCHEMICAL SENSING; FABRICATION YIELD; MICROELECTRONICS PROCESS; PATTERNING METHODS; SENSING APPLICATIONS; SINGLE-WALLED CARBON NANOTUBE FIELD EFFECT TRANSISTORS; TECHNOLOGICAL PROCESS; WAFER SCALE FABRICATION;

FABRICATION;

EID: 78650158044     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3504527     Document Type: Article

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