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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 6, 2010, Pages

Focused chromium ion beam

(4) Steele, A V a Knuffman, B a McClelland, J J a Orloff, J b

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b Thermo Fisher Scientific (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; ELECTRON OPTICS; ION BEAMS; ION BOMBARDMENT; ION SOURCES; MAGNETOS; METAL IONS; NANOSTRUCTURED MATERIALS; PROBES;

BEAM DIAMETERS; CHROMIUM IONS; EINZEL LENS; FOCUSED ION BEAM MICROSCOPY; LASER LIGHTS; MAGNETOOPTICAL TRAPS; MILLING SYSTEMS; NANO SCALE; NANOSCALE APPLICATIONS; PROBE SIZE; RAY TRACING SIMULATION; SECONDARY ELECTRON IMAGES;

CHROMIUM;

EID: 78650100130 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3502668 Document Type: Article

Times cited : (20)

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