Demonstration of phase-shift masks for extreme-ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  La Fontaine, Bruno ^a   Pawloski, Adam R ^a   Wood, Obert ^a   Deng, Yunfei ^a,e   Levinson, Harry J ^a   Naulleau, Patrick ^b   Denham, Paul E ^b   Gullikson, Eric ^b   Hoef, Brian ^b   Holfeld, Christian ^c   Chovino, Christian ^c   Letzkus, Florian ^d  

^a ADVANCED MICRO DEVICES   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c Advanced Mask Technology Center   (Germany)

^d Institut fur Mikroelektronik Stuttgart   (Germany)

^e KLA TENCOR CORPORATION   (United States)

Author keywords

Actinic characterization; EUV lithography; Phase shift masks

Indexed keywords

ETCHING; LITHOGRAPHY; MEASUREMENTS; MULTILAYERS; PERFORMANCE; PHASE SHIFT;

ACTINIC CHARACTERIZATION; EUV LITHOGRAPHY; PHASE PATTERNS; PHASE-SHIFT MASKS;

MASKS;

EID: 33745618406     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.652212     Document Type: Conference Paper

References (5)

1. O.R. Wood, II et al., "Use of attenuated phase masks in extreme ultraviolet lithography," J. Vac. Sci. Technol. B 15, 2448(1997)
2. S.D. Hector, S.I. Han, N.V. Edwards, K. Williams, R. Gregory, P.J.S. Mangat, and K. Rosford, Requirements for fabricating attenuated phase-shift masks for EUV lithography, First International Symposium on Extreme Ultraviolet Lithography, Dallas, October 14-17 (2002)
3. Y. Deng, B. La Fontaine, H.J. Levinson, A. Neureuther; Rigorous EM simulations of the influence of the structure of mask patterns on EUVL imaging; Proc. SPIE Conference on Microlithography, Emerging Lithography, Santa Clara (March 2003)
4. P. Naulleau, K. A. Goldberg, E. H. Anderson, K. Bradley, R. Delano, P. Denham, B. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, and J. Taylor, "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic", paper 5374-135, Emerging Lithographic Technologies VIII, Ed. R. S. Mackay, Proc. SPIE 5374 (2004), pp. 881-894.
5. th International Symposium on EUV Lithography, San Diego, (November 2005)