Influence of Ti coatings on field emission characteristics of nano-sheet carbon films

Vacuum

Volumn 85, Issue 4, 2010, Pages 531-534

  Gu, Guang Rui ^a   Li, Ying Ai ^b   Ito, Toshimichi ^c  

^a YANBIAN UNIVERSITY   (China)

^b JILIN UNIVERSITY   (China)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

Electric field model; Field emission; MWPCVD; Nano sheet carbon film; Titanium film

Indexed keywords

E-MODEL; ELECTRIC-FIELD MODEL; EMISSION CURRENT DENSITY; EVAPORATION METHOD; FIELD EMISSION PROPERTY; FIELD-EMISSION CHARACTERISTICS; METHANE GAS; MICROWAVE PLASMA; MWPCVD; NANO-SHEET CARBON FILM; SI(110); SPACE-CHARGE-LIMITED CURRENT; STATISTICAL SIZE EFFECT; THRESHOLD FIELDS; TI COATING; TI FILM; TIP STRUCTURE; TITANIUM FILM; TUBE-TYPE;

E REGION; ELECTRIC FIELDS; ELECTRON BEAMS; FIELD EMISSION; METHANE; NANOSHEETS; PLASMA DEPOSITION; QUARTZ; TITANIUM; TITANIUM SHEET;

CARBON FILMS;

EID: 78649666823     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.09.002     Document Type: Conference Paper

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