Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films

Chinese Physics B

Volumn 18, Issue 10, 2009, Pages 4547-4551

  Gu, Guang Rui ^a   Ito, Toshimichi ^b  

^a YANBIAN UNIVERSITY   (China)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Field emission; Microwave plasma chemical vapour deposition; Nano sheet carbon films; Space charge limited current

Indexed keywords

AU FILM; AU THIN FILMS; CHEMICAL VAPOUR DEPOSITION; ELECTRON BEAM EVAPORATION; ENHANCED FIELD EMISSION; FE PROPERTIES; MICROWAVE PLASMA; MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION; NANO-SHEET CARBON FILMS; SI WAFER; SPACE-CHARGE-LIMITED-CURRENT; THRESHOLD FIELDS; TIP STRUCTURE; TUBE-TYPE;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; E REGION; ELECTRIC FIELDS; ELECTRON BEAMS; FIELD EMISSION; GOLD; MICROWAVE TUBES; MICROWAVES; NANOSHEETS; OXIDE MINERALS; PAPER SHEETING; PLASMA DEPOSITION; PLASMAS; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

CARBON FILMS;

EID: 70350438576     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/18/10/075     Document Type: Article

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