Influence of atomic bonds on electrical property of boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition

Diamond and Related Materials

Volumn 19, Issue 12, 2010, Pages 1441-1445

  Sota, Hiroshi ^a   Kimura, Chiharu ^a   Aoki, Hidemitsu ^a   Sugino, Takashi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Boron carbon nitride; Plasma assisted CVD

Indexed keywords

ATOMIC BONDS; BAND GAP ENERGY; BCN FILMS; BORON CARBON NITRIDE; CHEMICAL BONDINGS; COMPOSITION RATIO; ELECTRICAL CHARACTERIZATION; ELECTRICAL PROPERTY; GROWTH CONDITIONS; OPTICAL AND ELECTRICAL PROPERTIES; REMOTE PLASMAS;

BORON; CARBON FILMS; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ENERGY GAP; FILM GROWTH; PLASMA DEPOSITION; PLASMAS; POLYMER BLENDS;

CARBON NITRIDE;

EID: 78649632203     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.06.021     Document Type: Article

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