Optical quality-assessment of high-order one-dimensional silicon photonic crystals with a reflectivity notch at λ ∼ 1.55 μm

IEEE Photonics Journal

Volumn 2, Issue 6, 2010, Pages 981-990

  Barillaro, Giuseppe ^a   Merlo, Sabina ^b   Surdo, Salvatore ^a   Strambini, Lucanos M ^a   Carpignano, Francesca ^b  

^a UNIVERSITY OF PISA   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

Author keywords

Micro and nano opto electro mechanical systems (MOEMS); modeling; optical properties of photonic materials; photonic materials; synthesis and fabrication methods

Indexed keywords

1-D PHOTONIC CRYSTAL; AVERAGE VALUES; ELECTROCHEMICAL MICRO-MACHINING; FABRICATION FEATURES; HIGH ASPECT RATIO; HIGH QUALITY; HIGH SPATIAL RESOLUTION; HIGH-ORDER; IN-PLANE; MICRO AND NANO OPTO-ELECTRO-MECHANICAL SYSTEMS (MOEMS); MICROFABRICATED; MODELING; NON DESTRUCTIVE; NON-IDEALITIES; NORMAL INCIDENCE; OPTICAL DISTRIBUTION; OPTICAL FEATURES; OPTICAL MEASUREMENT; OPTICAL METHODS; OPTICAL QUALITIES; OUT-OF-PLANE; PERCENTAGE ERROR; PHOTONIC MATERIALS; REFLECTIVITY SPECTRA; SAMPLE AVERAGE; SCANNING ELECTRON MICROSCOPES; SILICON PHOTONIC CRYSTALS; SILICON THICKNESS; SPECTRAL POSITION; SPECTRAL REFLECTIVITY; STRUCTURAL FEATURE; SYNTHESIS AND FABRICATION METHODS; THEORETICAL SPECTRA; THICKNESS VARIATION; TRANSMISSION WINDOW; VERTICAL STRUCTURES; WAVELENGTH RANGES;

ASPECT RATIO; FABRICATION; LOCATION; MATERIALS PROPERTIES; MECHANICAL ENGINEERING; MECHANICAL PROPERTIES; MOEMS; OPTICAL DATA PROCESSING; OPTICAL RECORDING; PHOTONIC CRYSTALS; REFLECTION; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

OPTICAL PROPERTIES;

EID: 78649284809     PISSN: 19430655     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOT.2010.2089440     Document Type: Article

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