Annealing effect on the optical response and interdiffusion of n -ZnO/p-Si (111) heterojunction grown by atomic layer deposition

Applied Physics Letters

Volumn 97, Issue 18, 2010, Pages

  Ku, Ching Shun ^a   Huang, Jheng Ming ^b   Cheng, Ching Yuan ^a   Lin, Chih Ming ^c   Lee, Hsin Yi ^a,b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING EFFECTS; ANNEALING TEMPERATURES; HYDROGEN ATOMS; IN-SITU; IN-SITU SYNCHROTRONS; INTER-DIFFUSION; ION MASS SPECTROMETER; OPTICAL RESPONSE; PHOTOLUMINESCENCE SPECTRUM; PHOTON RESPONSE; POLYCRYSTALLINE; SI(111) SUBSTRATE; TIME OF FLIGHT; ZNO FILMS; ZNO/P-SI;

ANNEALING; ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; ATOMS; DIFFRACTION; HETEROJUNCTIONS; MASS SPECTROMETRY; PHOTOLUMINESCENCE; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTAL ATOMIC STRUCTURE;

EID: 78649265046     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3511284     Document Type: Article

References (19)

1. C. S. Ku, H. Y. Lee, J. M. Huang, and C. M. Lin, Cryst. Growth Des. 1528-7483 10, 1460 (2010). 10.1021/cg9013043
2. H. Paul Maruska, F. Namavar, and N. M. Kalkhoran, Appl. Phys. Lett. 0003-6951 61, 1338 (1992). 10.1063/1.108467
3. H. Ohta, M. Orita, M. Hirano, and H. Hosono, J. Appl. Phys. 0021-8979 89, 5720 (2001). 10.1063/1.1367315
4. Ya. I. Alivov, J. E. Van Nostrand, D. C. Look, M. V. Chukichev, and B. M. Ataev, Appl. Phys. Lett. 0003-6951 83, 2943 (2003). 10.1063/1.1615308
5. Ya. I. Alivov, E. V. Kalinina, A. E. Cherenkov, D. C. Look, B. M. Ataev, A. K. Omaev, M. V. Chukichev, and D. M. Bagnall, Appl. Phys. Lett. 0003-6951 83, 4719 (2003). 10.1063/1.1632537
6. C. Yuen, S. F. Yu, S. P. Lau, and T. P. Chen, Appl. Phys. Lett. 0003-6951 86, 241111 (2005). 10.1063/1.1947889
7. W. I. Park and G. C. Yi, Adv. Mater. 0935-9648 16, 87 (2004). 10.1002/adma.200305729
8. D. C. Look, B. Claflin, Ya. I. Alivov, and S. J. Park, Phys. Status Solidi A 0031-8965 201, 2203 (2004). 10.1002/pssa.200404803
9. C. G. Van de Walle and R. A. Street, Phys. Rev. B 0556-2805 51, 10615 (1995). 10.1103/PhysRevB.51.10615
10. C. S. Ku, J. M. Huang, C. M. Lin, and H. Y. Lee, Thin Solid Films 0040-6090 518, 1373 (2009). 10.1016/j.tsf.2009.09.018
11. X. L. Xu, P. Wang, Z. Qi, H. Ming, J. Xu, H. Liu, C. S. Shi, G. Lu, and W. K. Ge, J. Phys.: Condens. Matter 0953-8984 15, L607 (2003). 10.1088/0953-8984/15/40/L01
12. T. Makino, K. Tamura, C. H. Chia, Y. Segawa, M. Kawasaki, A. Ohtomo, and H. Koinuma, Appl. Phys. Lett. 0003-6951 81, 2172 (2002). 10.1063/1.1506783
13. G. A. Shi, M. Stavola, S. J. Pearton, M. Thieme, E. V. Lavrov, and J. Weber, Phys. Rev. B 0556-2805 72, 195211 (2005). 10.1103/PhysRevB.72.195211
14. E. Burstein, Phys. Rev. 0031-899X 93, 632 (1954). 10.1103/PhysRev.93.632
15. C. G. Van de Walle, Phys. Rev. Lett. 0031-9007 85, 1012 (2000). 10.1103/PhysRevLett.85.1012
16. H. J. Ko, Y. F. Chen, S. K. Hong, H. Wenisch, T. Yao, and D. C. Look, Appl. Phys. Lett. 0003-6951 77, 3761 (2000). 10.1063/1.1331089
17. T. Makino, Y. Segawa, S. Yoshida, A. Tsukazaki, A. Ohtomo, and M. Kawasaki, Appl. Phys. Lett. 0003-6951 85, 759 (2004). 10.1063/1.1776630
18. M. Nagao, J. Phys. Chem. 0022-3654 75, 3822 (1971). 10.1021/j100694a007
19. C. S. Ku, H. Y. Lee, J. M. Huang, and C. M. Lin, Mater. Chem. Phys. 0254-0584 120, 236 (2010). 10.1016/j.matchemphys.2009.12.028